- idUS
- Listar por autor
Listar por autor "Yanguas Gil, Alejandro"
Mostrando ítems 1-5 de 5
-
Artículo
Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films
Cotrino Bautista, José; Yanguas Gil, Alejandro; Barranco Quero, Ángel; Rodríguez González-Elipe, Agustín (American Physical Society, 2006-06-26)The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced ...
-
Artículo
Measuring the electron temperature by optical emission spectroscopy in two temperature plasmas at atmospheric pressure: A critical approach
Yanguas Gil, Alejandro; Cotrino Bautista, José; Rodríguez González-Elipe, Agustín (American Institute of Physics, 2006)The measurement of the electron mean kinetic energy by identifying the electron temperature and the excitation temperature ...
-
Artículo
Reforming of ethanol in a microwave surface-wave plasma discharge
Yanguas Gil, Alejandro; Hueso Martos, José Luis; Cotrino Bautista, José; Caballero Martínez, Alfonso; Rodríguez González-Elipe, Agustín (American Institute of Physics, 2004)Hydrogen production through plasma reforming of ethanol at room temperature and moderate pressure has been carried out in ...
-
Artículo
Relationship between scaling behavior and porosity of plasma-deposited TiO2 thin films
Borrás, A.; Yanguas Gil, Alejandro; Barranco Quero, Ángel; Cotrino Bautista, José; Rodríguez González-Elipe, Agustín (American Physical Society, 2007)The growth of TiO2 thin films prepared by plasma enhanced chemical vapor deposition has been studied by analyzing their ...
-
Artículo
Scaling behavior and mechanism of formation of Si O2 thin films grown by plasma-enhanced chemical vapor deposition
Yanguas Gil, Alejandro; Cotrino Bautista, José; Walkiewicz-Pietrzykowska, A.; Rodríguez González-Elipe, Agustín (American Physical Society, 2007)This paper reports a study of the kinetic roughening of Si O2 thin films prepared by plasma-enhanced chemical vapor ...